SULFONATE AND RESIST COMPOSITION
申请(专利)号： KR20030058793
专利号： KR20040018962A 主分类号： C07C309/58 申请权利人： SUMITOMO
CHEMICAL CO., LTD. 公开国代码： KR 优先权国家： JP
摘 要：
PURPOSE: A sulfonate and a chemical amplification positive resist composition containing the sulfonate are provided, to obtain a composition suitable for
lithographic printing using an excimer laser such as ArF and KrF and having excellent photosensitivity, resolution, line edge roughness and pattern profile. CONSTITUTION: The sulfonate is
represented by the formula I, wherein Q1, Q2, Q3, Q4 and Q5 are independently H, an alkyl group of C1-C16, an alkoxy
group of C1-C16, a halogen atom, an aryl group of C6-C12, an aralkyl group of C7-C12, a cyano group, a sulfide group, a hydroxyl group, a nitro group or a group represented by -COO-X-Cy1 (wherein X is an alkylene group and at least one -CH2- of alkylene can be substituted with -O- or -S-, and Cy1 is an alicyclic
hydrocarbon group of C3-C20); A+ is a counter ion; and at least one among Q1, Q2, Q3, Q4 and Q5 is the group
申请日： 2003-08-25 公开公告日： 2004-03-04
分类号： C07C309/58 发明设计人： UETANI YASUNORI;
MORIUMA HIROSHI; YAMAGUCHI SATOSHI 申请国代码： KR
优先权： 20020826 JP JP-P-2002-00244971; 20021101 JP JP-P-2002-00319504
摘 要 附 图：
represented by -COO-X-Cy1. The
composition comprises the sulfonate of the formula I; and a resin which contains a structural unit having an acid-labile group, is insoluble or hardly soluble in an alkali aqueous solution, but becomes soluble in an alkali aqueous solution by the action of an acid. 主权项：
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SULFONATE AND RESIST COMPOSITION
