Vanadium oxide thin films deposited on indium tin oxide glass by radio-frequency magnetron

Vanadium oxide thin films deposited on indium tin

oxide glass by radio-frequency magnetron

sputtering

王学进;费允杰;熊艳云;聂玉昕;冯克安;李林德

【期刊名称】《中国物理：英文版》 【年(卷),期】2002(011)007

【摘要】Highly oriented VO2(B), VO2(B) + V6O13 films were grown on indium tin oxide glass by radio-frequency mag-netron sputtering. Single phase V6O13 films were obtained from VO2(B) + V6O13 films by annealing at 480℃C invacuum. The vanadium oxide films were characterized by x-ray diffraction and x-ray photoelectron spectra (XPS). Itwas found that the formation of vanadium oxide films was affected by substrate temperature and annealing time, be-cause high substrate temperature and annealing were favourable to further oxidation. Therefore, the formation of highvalance vanadium oxide films was realized. The V6O13 crystalline sizes become smaller with the increase of annealingtime. XPS analysis revealed that the energy position for all the samples was almost constant, but the broadening ofthe V2p3/2 line of the annealed sample was due to the smaller crystal size of V6O13. 【总页数】4页(737-740) 【

关

键

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vanadium

oxide;x-ray

photoelectron

spectroscopy;annealing;sputtering