N2流量对中频非平衡磁控溅射TiAlN薄膜结构及性能的
影响
吴劲峰;何乃如;邱孟柯;吉利;李红轩;黄小鹏
【期刊名称】《功能材料》 【年(卷),期】2013(044)001
【摘要】TiA1N films were deposited by mid-frequency unbalanced magnetron sputtering on stainless steel AI-SI202 and Si wafer P(111). The structure and properties of the TiAIN films were investigated by atomic force microscopy ,microXAM-3D surface profiler. X-ray diffraction, X-ray photoelectron spectroscopy and nanoin-dentation . With the nitrogen flows increasing the deposition of TiAIN films is decreasing, the Al, Ti ratio in-creasing first and then decreasing hardly. The films was made up of cubic crystalline TiN. The grain size be-came smaller and the columnar microstructure became looser. When the nitrogen flow comes to 20mL, min. the film shows the best hardness and bonding force.%采用非平衡磁控溅射技术在AISI202不锈钢片和P(111)单晶硅基底上制备了TiAlN薄膜,并利用场发射扫描电镜(FESEM)、三维轮廓仪、X射线衍射仪(XRD)、X射线电子能谱仪(XPS)、纳米压痕仪对薄膜的结构和性能进行了考查.结果表明,随着N2流量的升高,TiAlN薄膜的沉积速率降低,Al/Ti比率先升高后迅速降低；薄膜主要由TiN立方晶构成,且随N2流量的升高晶粒尺寸减小,柱状晶结构变疏松.在氮气流量为20mL/min时,薄膜具有最高的硬度及结合力.
N2流量对中频非平衡磁控溅射TiAlN薄膜结构及性能的影响
