A nano-scale alignment method for imprint
lithography
WANG Li;LU Bing-heng;DING Yu-cheng;QIU Zhi-hui;LIU Hong-zhong
【期刊名称】《中国高等学校学术文摘·机械工程》 【年(卷),期】2006(001)002
【摘要】A novel nano-scale alignment technique based generated by two pairs of quadruple gratings on mold and wafer are optically projected onto two photo-detector arrays,alignment errors in the x and y directions.The experiment sensitive to relative displacement of the mold and wafer,and the alignment accuracy obtained in the x and y directions
and
in
θare
±20
nm,±25
nm
and
±1
μrad
(3σ),respectively.They can meet the requirements of alignment accuracy for submicron imprint lithography. 【总页数】5页(157-161)
【关键词】imprint lithography;grating;nano-scale alignment;moiré signal
【作者】WANG Li;LU Bing-heng;DING Yu-cheng;QIU Zhi-hui;LIU Hong-zhong
【作者单位】The State-key Lab of Manufacturing Systems Engineering,Xi'an Jiaotong University,Xi'an 710049,China;The State-key Lab
of
Manufacturing
Systems
Engineering,Xi'an
Jiaotong
University,Xi'an 710049,China;The State-key Lab of Manufacturing
A nano-scale alignment method for imprint lithography
