Soft thermal nanoimprint lithography using a
nanocomposite mold
Viraj Bhingardive;Liran Menahem;Mark Schvartzman
【期刊名称】《纳米研究（英文版）》 【年(卷),期】2024(011)005
【摘要】Soft nanoimprint lithography has been limited to ultraviolet (UV) curable resists. Here, we introduce a novel approach for soft thermal nanoimprinting. This unprecedented combination of the terms \and \for nanoimprinting became possible thanks to an innovative
nanocomposite
mold
consisting
of
a
flexible
polydimethylsiloxane (PDMS) substrate with chemically attached rigid relief features. We used soft thermal nanoimprinting to produce high-resolution nanopatterns with a sub-100 nm feature size. Furthermore, we demonstrate the applicability of our nanoimprint approach for the nanofabrication of thermally imprinted nanopatterns on non-planar surfaces such as lenses. Our new nanofabrication strategy paves the way to numerous applications that require the direct fabrication of functional nanostructures on unconventional substrates. 【总页数】10页(2705-2714) 【关键词】
【作者】Viraj Bhingardive;Liran Menahem;Mark Schvartzman
【作者单位】Department of Materials Engineering, Isle Katz Institute of
Soft thermal nanoimprint lithography using a nanocomposite mold
